Practical Lithography: Enriched edition. Mastering the Art of Lithography: Techniques, History, and Applications for Artists and Printmakers

In "Practical Lithography," Alfred Seymour delves into the intricate art and science of lithographic printing, providing both a historical overview and a comprehensive guide to techniques and practices. The book is characterized by its clear, methodical prose, making the complexities of lithography accessible to artists and printers alike. Seymour situates his work within the wider context of printmaking, emphasizing the interplay between artistic expression and technical precision, while also addressing the evolution of lithography as a medium in the fine arts and commercial printing. Alfred Seymour, a prominent figure in the late 19th-century artistic community, was deeply influenced by the burgeoning industrial age and its impact on visual culture. His practical experience in printing and keen understanding of artistic principles propelled him to share his knowledge through this work, addressing both the technical and aesthetic considerations necessary for mastery in lithography. Seymour's background in art and affinity for precision reflect the duality he captures in this guide, bridging the gap between creation and the mechanics of reproduction. Recommended for artists, historians, and technicians alike, "Practical Lithography" is an essential resource for anyone seeking to explore this dynamic medium. Seymour's insightful commentary and hands-on approach will inspire both novices and seasoned practitioners to refine their craft, while also igniting a deeper appreciation for the rich heritage of lithographic art.

In this enriched edition, we have carefully created added value for your reading experience: - Hand‐picked Memorable Quotes shine a spotlight on moments of literary brilliance. - Interactive footnotes clarify unusual references, historical allusions, and archaic phrases for an effortless, more informed read.

© 2019 Good Press (E-raamat): 4064066157371

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E-raamat: 18. detsember 2019